Patent · US Active

Gas system for reactive deposition process

US9732412B2 · kind B2 · utility

1Cited by

2References

9Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Gerd Hoffmann · Bruchköbel, DE
Alexander Wolff · Radebeul, DE

Key dates

Filing date	Apr 29, 2011
Grant date	Aug 15, 2017
Priority date	—
Expiry date	Jun 22, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/564
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A gas lance unit configured for a reactive deposition process with a plurality of spaced apart crucibles, wherein spaces are provided between the crucibles, is described. The gas lance unit includes a gas guiding tube having one or more outlets for providing a gas for the reactive deposition process, and a condensate guiding element for guiding a condensate, particularly an aluminum condensate, to one or more positions above the spaces.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.