Resist composition and method for producing resist pattern
US9740097B2 · kind B2 · utility
0Cited by
15References
5Claims
0Family size
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Key dates
| Filing date | Mar 30, 2016 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Apr 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other than a resin, and a solvent. The resist composition of the disclosure can provide a resist pattern showing excellent shape and detachability, therefore, the present resist composition can be used for semiconductor microfabrication with resist patterns showing excellent shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.