CVD apparatus with gas delivery ring
US9741575B2 · kind B2 · utility
3Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2014 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Mar 10, 2034 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04F5/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure relates to a chemical vapor deposition apparatus and associated methods. In some embodiments, the CVD apparatus has a vacuum chamber and a gas import having a gas import axis through which a process gas is imported into the vacuum chamber and being arranged near an upper region of the vacuum chamber. At least one exhaust port is arranged near a bottom region of the vacuum chamber. The CVD apparatus also has a gas delivery ring with an outlet disposed under the gas import. A pressure near the outlet of the gas delivery ring is smaller than that of the rest of the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.