Patent · US Active

Method and apparatus for forming a substrate web track in an atomic layer deposition reactor

US9745661B2 · kind B2 · utility

3Cited by

3References

11Claims

0Family size

Assignee

Picosun Oy · FI

Inventors

Timo Malinen · Espoo, FI
Vaino Kilpi · Sundsberg, FI

Key dates

Filing date	Jun 27, 2013
Grant date	Aug 29, 2017
Priority date	—
Expiry date	Jun 27, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/458
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An apparatus and method for forming a substrate web track with a repeating pattern into a reaction space of a deposition reactor by moving a first set of support rolls in relation to a second set of support rolls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.