Waveguide structure, waveguide coupling structure, and production method
US9746606B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 2016 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | May 12, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides three waveguide structures, including a protruding-type waveguide structure, a buried-type waveguide structure, and a redeposited-type waveguide structure, the protruding-type waveguide structure includes two axisymmetrically disposed first ends, and the first end is sequentially divided into a first region, a second region, and a third region in a direction toward an axis of symmetry; and the waveguide structure includes a first silicon substrate layer, a second silicon substrate layer, a first silicon dioxide layer, a second silicon dioxide layer, and a first silicon waveguide layer. The waveguide structure and the waveguide coupling structure that are provided in the present invention have advantages of a small size, low polarization dependence, and low temperature sensitivity, and a crosstalk value is greater than 25 dB, which meets a requirement of a passive optical network system, and provides feasibility for commercialization of the arrayed waveguide grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.