Tantalum-containing film forming compositions and vapor deposition of tantalum-containing films
US9748249B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Apr 15, 2016 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | Apr 15, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/692
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Tantalum-containing film forming compositions are disclosed, along with methods of synthesizing the same, and methods of forming Tantalum-containing films on one or more substrates via vapor deposition processes using the Tantalum-containing film forming composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.