Facility and method for depositing a width adjustable film of ordered particles onto a moving substrate
US9751105B2 · kind B2 · utility
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4References
10Claims
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Key dates
| Filing date | Jul 10, 2012 |
| Grant date | Sep 5, 2017 |
| Priority date | — |
| Expiry date | Apr 24, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/203
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A facility for depositing a film of ordered particles onto a moving substrate, the facility configured to allow deposition, onto the substrate, of a film of ordered particles escaping from a particle outlet of a transfer zone having a first width. The facility further includes an accessory device in a form of a deposit head, provided to seal the particle outlet and configured to allow the deposition, onto the substrate, of a film of ordered particles escaping from an end of a particle transfer channel of the deposit head, the end having a second width strictly lower than the first width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.