Apparatus and method for cleaning semiconductor substrate
US9761466B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2014 |
| Grant date | Sep 12, 2017 |
| Priority date | — |
| Expiry date | Sep 20, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning apparatus for a semiconductor substrate includes a belt conveyor, a treatment head that executes cleaning, rinsing and drying treatments, a rinse water supplying mechanism that supplies rinse water adjusted to a predetermined pH value to the treatment head and configured to rinse the substrate applies heat to the rinse water to set a rinse water temperature to 70° or above, and an optical mechanism. The treatment head is configured to rinse the substrate. The optical mechanism is configured to recognize a pattern on the semiconductor substrate so that the semiconductor substrate can be automatically placed on the belt conveyor with a direction of the recognized pattern and a feeding direction of the belt conveyor having a predetermined relationship. The treatment head includes a drying treatment mechanism configured to execute both a drying treatment with use of drying solvent and lamp annealing in execution of drying treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.