Edge-dominant alignment method in exposure scanner system
US9766559B2 · kind B2 · utility
1Cited by
2References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 30, 2013 |
| Grant date | Sep 19, 2017 |
| Priority date | — |
| Expiry date | Mar 20, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F2009/005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An edge-dominant alignment method for use in an exposure scanner system is provided. The method includes the steps of: providing a wafer having a plurality of shot areas, wherein each shot area has a plurality of alignment marks; determining a first outer zone of the wafer, wherein the first outer zone includes a first portion of the shot areas along a first outer edge of the wafer; determining a scan path according to the shot areas of the first outer zone; and performing an aligning process to each shot area of the first outer zone according to the scan path and an alignment mark of each shot area of the first outer zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.