Patent · US Active

Imprint apparatus and article manufacturing method

US9770850B2 · kind B2 · utility

1Cited by
1References
14Claims
0Family size

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Inventors

Key dates

Filing dateApr 16, 2014
Grant dateSep 26, 2017
Priority date
Expiry dateSep 5, 2035

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29L2031/34
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.