Apparatus and methods for combined brightfield, darkfield, and photothermal inspection
US9772297B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 10, 2015 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | Jul 12, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/06113
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.