Patent · US Active

Transistor performance modification with stressor structures

US9773793B2 · kind B2 · utility

0Cited by
12References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 9, 2009
Grant dateSep 26, 2017
Priority date
Expiry dateMay 6, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/792

Abstract

A transistor structure with stress enhancement geometry aligned above the channel region. Also, a transistor structure with stress enhancement geometries located above and aligned with opposite sides of the channel region. Furthermore, methods for fabricating integrated circuits containing transistors with stress enhancement geometries.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.