Transistor performance modification with stressor structures
US9773793B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Oct 9, 2009 |
| Grant date | Sep 26, 2017 |
| Priority date | — |
| Expiry date | May 6, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/792
Abstract
A transistor structure with stress enhancement geometry aligned above the channel region. Also, a transistor structure with stress enhancement geometries located above and aligned with opposite sides of the channel region. Furthermore, methods for fabricating integrated circuits containing transistors with stress enhancement geometries.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.