Patent · US Active

Amino(iodo)silane precursors for ALD/CVD silicon-containing film applications and methods of using the same

US9777373B2 · kind B2 · utility

1Cited by
1References
7Claims
0Family size

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Key dates

Filing dateDec 30, 2015
Grant dateOct 3, 2017
Priority date—
Expiry dateDec 30, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/31111
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Disclosed are amino(iodo)silane precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes. The disclosed amino(iodo)silane precursors include SiH2I(N(iPr)2) or SiH2I(N(iBu)2).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.