Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom

US9783882B2 · kind B2 · utility

Assignee

• H.C. STARCK INC. · US

Inventors

• Steven A. Miller · Pinellas Park, US
• Prabhat Kumar · Framingham, US
• Richard Wu · North Chelmsford, US
• Shuwei Sun · Framingham, US
• Stefan Zimmermann · Laufenbürg, DE
• Olaf Schmidt-Park · Krefeld, DE

Key dates

• Filing date: Sep 10, 2014
• Grant date: Oct 10, 2017
• Expiry date: Jan 31, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/332
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.