Parallel multi wafer axial spin clean processing using spin cassette inside movable process chamber
US9786486B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 29, 2015 |
| Grant date | Oct 10, 2017 |
| Priority date | — |
| Expiry date | Jun 29, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/24
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.