Method and system to reduce outgassing in a reaction chamber
US9790595B2 · kind B2 · utility
449Cited by
648References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2015 |
| Grant date | Oct 17, 2017 |
| Priority date | — |
| Expiry date | Jan 27, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45544
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.