Devices and systems for spatial averaging of electron backscatter diffraction patterns
US9791390B2 · kind B2 · utility
1Cited by
1References
20Claims
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Key dates
| Filing date | Jan 22, 2016 |
| Grant date | Oct 17, 2017 |
| Priority date | — |
| Expiry date | Apr 17, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20058
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A diffraction pattern is averaged with adjacent diffraction patterns to increase a signal to noise ratio thereof and improve indexing accuracy. The pixels of a diffraction pattern image are averaged with a correlated pixel from one or more adjacent diffraction patterns. Noise artifacts are reduced in intensity, while signals present in each of the patterns reinforce one another to produce an averaged diffraction pattern which is then indexed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.