Patent · US Active

Techniques and apparatus for manipulating an ion beam

US9793087B2 · kind B2 · utility

0Cited by

1References

19Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

James S. Buff · Brookline, US
Victor M. Benveniste · Gloucester, US
Frank Sinclair · Quincy, US

Key dates

Filing date	Sep 10, 2015
Grant date	Oct 17, 2017
Priority date	—
Expiry date	Dec 28, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31701
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.