Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask
US9798234B2 · kind B2 · utility
4Cited by
3References
11Claims
0Family size
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Key dates
| Filing date | Jul 18, 2016 |
| Grant date | Oct 24, 2017 |
| Priority date | — |
| Expiry date | Jul 18, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.