Method and apparatus for compensating at least one defect of an optical system
US9798249B2 · kind B2 · utility
0Cited by
7References
20Claims
0Family size
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Key dates
| Filing date | Aug 12, 2014 |
| Grant date | Oct 24, 2017 |
| Priority date | — |
| Expiry date | Aug 28, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a method for compensating at least one defect of an optical system which includes introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.