Patent · US Active

Molybdenum (IV) amide precursors and use thereof in atomic layer deposition

US9802220B2 · kind B2 · utility

18Cited by

8References

1Claims

0Family size

Assignee

Merck Patent GmbH · DE

Inventors

Peter Nicholas Heys · Crewe, US
Rajesh Odedra · Altrincham, GB
Sarah Louise Hindley · Liverpool, GB

Key dates

Filing date	Aug 25, 2011
Grant date	Oct 31, 2017
Priority date	—
Expiry date	Aug 25, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45525
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is —NR1R2; R1 and R2 are C1-C6-alkyl or hydrogen; R is C1-C6-alkyl; and n is zero, 1, 2 or 3. Further, methods of forming MoO2 films by atomic layer deposition (ALD) using Formula (I) complexes and Mo[N(Me)(Et)]4 are disclosed herein.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.