Inventor · Altrincham, GB

Rajesh Odedra

18Patents
7h-index
28Co-inventors
66Inventor score

Filing activity: Mar 5, 2001 → Sep 2, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US8728955B2 Method of plasma activated deposition of a conformal film on a substrate surface Electricity 62 Active
US6698728B1 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites Chemistry; Metallurgy 23 Expired
US9802220B2 Molybdenum (IV) amide precursors and use thereof in atomic layer deposition Chemistry; Metallurgy 18 Active
US9175023B2 Molybdenum allyl complexes and use thereof in thin film deposition Chemistry; Metallurgy 17 Active
US8039062B2 Methods of atomic layer deposition using hafnium and zirconium-based precursors Chemistry; Metallurgy 15 Active
US7282119B2 Process and apparatus for the isolation of pure, or substantially pure, organometallic compounds Chemistry; Metallurgy 12 Expired
US8221852B2 Methods of atomic layer deposition using titanium-based precursors Chemistry; Metallurgy 7 Active
US9028917B2 High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films Chemistry; Metallurgy 3 Active
US8272626B2 Bubbler for the transportation of substances by a carrier gas Chemistry; Metallurgy 2 Active
US11643422B2 Organometallic compounds and purification of such organometallic compounds Physics 1 Active
US8481121B2 Methods of forming thin metal-containing films by chemical phase deposition Chemistry; Metallurgy 1 Active
US6573053B1 Analysis method Chemistry; Metallurgy 1 Expired
US8476467B2 Organometallic precursors for use in chemical phase deposition processes Chemistry; Metallurgy 1 Active
US10240230B2 Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers Electricity 0 Active
USRE45124E1 Methods of atomic layer deposition using titanium-based precursors General 0 Active
US11802134B2 Organometallic compound and method Chemistry; Metallurgy 0 Active
US8927748B2 Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films Electricity 0 Active
US11498938B2 Organometallic compounds useful for chemical phase deposition Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.