Patent · US Active

Support mechanism and substrate processing apparatus

US9803926B2 · kind B2 · utility

264Cited by
5References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 26, 2015
Grant dateOct 31, 2017
Priority date
Expiry dateJun 26, 2035

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF27B17/0025
  • WIPO fieldThermal processes and apparatus
  • WIPO sectorMechanical engineering

Abstract

The present disclosure provides a support mechanism for supporting a cover that performs sealing of a furnace opening of a heat treatment furnace or release the sealing by being moved up or down by an elevating unit. The support mechanism includes a first elastic body having a first elastic modulus; and a second elastic body having a second elastic modulus larger than the first elastic modulus. A reaction force in relation to the first elastic body is applied to the cover when the cover abuts on the furnace opening by being moved up by the elevating unit, and a reaction force in relation to the first elastic body and the second elastic body is applied to the cover after the cover abuts on the furnace opening by being moved up by the elevating unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.