Method for measuring three-dimensional shape of silica glass crucible, and method for producing monocrystalline silicon
US9810526B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2012 |
| Grant date | Nov 7, 2017 |
| Priority date | — |
| Expiry date | Oct 8, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for measuring a three-dimensional shape of an inner surface of a vitreous silica crucible which enables the measurement of the three-dimensional shape of the inner surface of the crucible without contaminating the inner surface of the crucible, is provided. According to the present invention, a method for measuring a three-dimensional shape of a vitreous silica crucible, including a fogging step to form a fog onto an inner surface of the vitreous silica crucible, a three-dimensional shape measuring step to measure a three-dimensional shape of the inner surface, by measuring a reflected light from the inner surface irradiated with light, is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.