Localized, in-vacuum modification of small structures
US9812286B2 · kind B2 · utility
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27References
17Claims
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Key dates
| Filing date | Dec 22, 2015 |
| Grant date | Nov 7, 2017 |
| Priority date | — |
| Expiry date | Dec 22, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2801
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.