System and method for supplying and dispensing bubble-free photolithography chemical solutions
US9817315B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2014 |
| Grant date | Nov 14, 2017 |
| Priority date | — |
| Expiry date | Dec 13, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86187
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.