Patent · US Active

Separation apparatus, separation system, and separation method

US9827756B2 · kind B2 · utility

0Cited by
1References
24Claims
0Family size

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Key dates

Filing dateMar 16, 2012
Grant dateNov 28, 2017
Priority date
Expiry dateMar 16, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1972
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A separation apparatus for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive, into the processing target substrate and the supporting substrate includes: a first holding unit that includes a heating mechanism heating the processing target substrate and holds the processing target substrate; a second holding unit that includes a heating mechanism heating the supporting substrate and holds the supporting substrate; a moving mechanism that relatively moves at least the first holding unit or the second holding unit in a horizontal direction; and a porous part that is annularly provided along an outer peripheral portion of the first holding unit and formed with a plurality of pores, and supplies an inert gas to the outer peripheral portion of the first holding unit holding the processing target substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.