Patent · US Active

PSM blank for enhancing small size CD resolution

US9829786B2 · kind B2 · utility

1Cited by

2References

13Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Chun-Lang Chen · Madou, TW
Tzung-Shiun Liu · Tainan, TW

Key dates

Filing date	Jun 29, 2015
Grant date	Nov 28, 2017
Priority date	—
Expiry date	Jan 14, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/80
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A phase shift mask blank includes a transparent substrate, a phase shift layer, a first hard mask layer and an opaque layer. The transparent substrate is disposed on the transparent substrate. The first hard mask layer is disposed on the phase shift layer. The phase shift layer has an etching selectivity with respect to the first hard mask layer. The opaque layer is disposed on the first hard mask layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.