Defect observation system and defect observation method
US9842723B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2013 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Oct 19, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
When contamination or local electrification is generated during acquisition of a low-magnification image, if a high-magnification image contains both a portion in which the contamination or local electrification is generated and a portion in which the contamination or local electrification is not generated, a region whose image quality has changed due to the contamination or local electrification is erroneously recognized as a defect. Thus, defect detection fails or it may be impossible to correctly determine the feature quantity of a defect. The invention provides a defect observation system that acquires sample images at a low magnification and a high magnification, and sets the position or size of the field of view of the high-magnification image or the electron beam irradiation range during acquisition of the low-magnification image no that the image acquired at the high magnification does not contain the outer edge of the image acquired at the low magnification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.