Method and system for naturally oxidizing a substrate

US9842755B2 · kind B2 · utility

Assignee

• SINGULUS TECHNOLOGIES AG · DE

Inventors

• Berthold Ocker · Hanau, DE
• Wolfram Maass · Gelnhausen, DE

Key dates

• Filing date: Feb 18, 2014
• Grant date: Dec 12, 2017
• Expiry date: Feb 25, 2034

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A system and method for treating a substrate in a reaction chamber. A transfer chamber is arranged between a first lock and a second lock, wherein the second lock is provided between the transfer chamber and the reaction chamber. A substrate is transferred into the transfer chamber through the first lock, and the first lock is closed. In a next step, the transfer chamber is flooded with the same gas as in the reaction chamber and the pressure and temperature of the gaseous atmosphere in the transfer chamber is controlled to be the same as in the reaction chamber. Then, the second lock is opened and the substrate is transferred from the transfer chamber into the reaction chamber to treat the substrate. A computer program product for carrying out the above method.