Dressing apparatus, polishing apparatus having the dressing apparatus, and polishing method
US9855638B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 9, 2014 |
| Grant date | Jan 2, 2018 |
| Priority date | — |
| Expiry date | Mar 18, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B53/005
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A dressing apparatus capable of bringing an overall dressing surface of a dresser into uniform sliding contact with a polishing surface of a polishing pad and capable of uniformly dressing the overall polishing surface of the polishing pad is disclosed. The dressing apparatus includes a dresser configured to rub against a polishing surface to dress the polishing surface that is used for polishing a substrate, a dresser shaft that applies a load to the dresser, at least one load-applying device configured to apply a downward load to a part of a peripheral portion of the dresser, and an operation controller configured to control operation of the load-applying device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.