Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
US9862668B2 · kind B2 · utility
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Key dates
| Filing date | Oct 19, 2015 |
| Grant date | Jan 9, 2018 |
| Priority date | — |
| Expiry date | Oct 19, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/72
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.