Pellicle and method for manufacturing the same
US9864270B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 2016 |
| Grant date | Jan 9, 2018 |
| Priority date | — |
| Expiry date | Apr 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.