Substrate processing apparatus
US9869022B2 · kind B2 · utility
9Cited by
1References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 30, 2015 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Feb 19, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing apparatus includes a shower head configured to disperse a gas; a process vessel installed at a downstream side of the shower head and configured to have a process space that allows a substrate to be processed by a process gas therein; a gas supplier connected to the shower head; a shower head gas exhauster connected to the shower head; and a capturing assembly configured to capture a component different from the process gas within the shower head.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.