Collector in an extreme ultraviolet lithography system with optimal air curtain protection
US9869934B2 · kind B2 · utility
139Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2016 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Jun 27, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.