Mirror arrangement for a lithography apparatus and method for producing the same
US9869937B2 · kind B2 · utility
0Cited by
2References
33Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 6, 2015 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Aug 11, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49817
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear wall and a side wall of the mirror body, the side wall being arranged between the front wall and the rear wall, wherein at least one supporting element is provided in the cavity between the front wall and the rear wall; and after producing the mirror body, at least partly removing the supporting element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.