Method of manufacturing a temperature-compensated micro-electromechanical device
US9878903B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 6, 2014 |
| Grant date | Jan 30, 2018 |
| Priority date | — |
| Expiry date | Nov 25, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/43
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods of forming micro-electromechanical device include a semiconductor substrate, in which a first microstructure and a second microstructure of reference are integrated. The first microstructure and the second microstructure are arranged in the substrate so as to undergo equal strains as a result of thermal expansions of the substrate. Furthermore, the first microstructure is provided with movable parts and fixed parts with respect to the substrate, while the second microstructure has a shape that is substantially symmetrical to the first microstructure but is fixed with respect to the substrate. By subtracting the changes in electrical characteristics of the second microstructure from those of the first, variations in electrical characteristics of the first microstructure caused by changes in thermal expansion or contraction can be compensated for.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.