Patent · US Active

Pattern projection using micro-lenses

US9885459B2 · kind B2 · utility

3Cited by

7References

14Claims

0Family size

Assignee

Apple Inc. · US

Inventors

Barak Freedman · Or Akiva, IL
Alexander Shpunt · Nes Ziona, IL
Meir Machlin · Ashdod, IL
Yoel Arieli · Jerusalem, IL

Key dates

Filing date	Jun 30, 2013
Grant date	Feb 6, 2018
Priority date	—
Expiry date	Jul 28, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH04N13/30
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

An illumination assembly includes a light source, which is configured to emit optical radiation. A transparency containing a plurality of micro-lenses, which are arranged in a non-uniform pattern and are configured to focus the optical radiation to form, at a focal plane, respective focal spots in the non-uniform pattern. Optics are configured to project the non-uniform pattern of the focal spots from the focal plane onto an object.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.