Projection exposure methods and systems

US9885958B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventor

• Paul Graeupner · Aalen, DE

Key dates

• Filing date: Dec 1, 2014
• Grant date: Feb 6, 2018
• Expiry date: Jun 27, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other.