Lithographic apparatus and device manufacturing method
US9885964B2 · kind B2 · utility
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4References
16Claims
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Key dates
| Filing date | Oct 24, 2012 |
| Grant date | Feb 6, 2018 |
| Priority date | — |
| Expiry date | Feb 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.