Patent · US Active

Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity

US9897724B2 · kind B2 · utility

0Cited by

2References

16Claims

0Family size

Assignee

KONINIKLIJKE PHILIPS N.V. · NL

Inventors

Peter Zink · Aachen, DE
Christof Metzmacher · Verviers, BE
Rolf Theo Anton Apetz · Aachen, DE

Key dates

Filing date	Aug 3, 2015
Grant date	Feb 20, 2018
Priority date	—
Expiry date	Apr 3, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/3492
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention relates to an optical device and a method of in situ treating an optical component (2, 6, 13) reflecting EUV and/or soft X-ray radiation in said optical device, said optical component (2, 6, 13) being arranged in a vacuum chamber (14) of said optical device and comprising one or several reflecting surfaces (3) having a top layer of one or several surface materials. In the method, a source (1, 5) of said one or several surface materials is provided in said chamber (14) of said optical device and surface material from said source (1, 5) is deposited on said one or several reflecting surfaces (3) during operation and/or during operation-pauses of said optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.