Ebeam three beam aperture array
US9897908B2 · kind B2 · utility
0Cited by
3References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2014 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Dec 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.