Method of forming pattern and developer for use in the method
US9897922B2 · kind B2 · utility
10Cited by
6References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2016 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Aug 12, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.