Patent · US Active

Raised e-fuse

US9899319B2 · kind B2 · utility

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18Claims
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Assignee

Inventors

Key dates

Filing dateFeb 9, 2017
Grant dateFeb 20, 2018
Priority date
Expiry dateFeb 9, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/201
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor device with a semiconductor-on-insulator (SOI) structure is provided including an insulating layer and a semiconductor layer formed on the insulating layer and a fuse. The fuse includes a first at least partially silicided raised semiconductor region with a first silicided portion and, adjacent to the first at least partially silicided raised semiconductor region, a second at least partially silicided raised semiconductor region with a second silicided portion. The second silicided portion is formed in direct physical contact with the first silicided portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.