Reticle pod with cover to baseplate alignment system
US9919863B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2013 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Aug 16, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49895
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An alignment system for aligning the cover and base of an inner pod of a reticle carrier. The cover and base can each be provided with hard planar surface seal zones on the bottom surface and the top surface, respectively. The cover of the inner pod may be provided with a through hole or a blind hole into which an alignment pin is disposed. The base is provided with a guide recess to receive the distal end of the alignment pin. The alignment pin operates to limit contact surface area between the cover and the base during that is in sliding contact, thus inhibiting particulate generation. Low particulate-generating materials, such as stainless steel or polyamide-imide, can also be utilized to further reduce particulate generation. Furthermore, the cover and base can each be unitary without need for fastening components thereto, thereby eliminating clamped surfaces that can entrap and subsequently shed particulates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.