Imprint method for an imprint apparatus which transfers a pattern onto a substrate by using a mold
US9921470B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 13, 2013 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Nov 3, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2059/023
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an imprint apparatus which transfers a pattern onto a substrate by using a mold including a first surface with a pattern region where an unevenness pattern is formed, and a second surface opposite to the first surface, the mold including a first pattern group formed between the second surface and a surface of a convex portion in the unevenness pattern, or on the second surface, the apparatus comprising a second pattern group, a detection unit configured to detect a mark group formed by light having passed through the first pattern group and the second pattern group, and a calculation unit configured to calculate a position deviation between the first pattern group and the second pattern group from the mark group detected by the detection unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.