Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image
US9921475B1 · kind B1 · utility
1Cited by
11References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 31, 2016 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Aug 31, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photoacid-generating compound has the structurewhere R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.