Structurally controlled deposition of silicon onto nanowires
US9923201B2 · kind B2 · utility
10Cited by
48References
25Claims
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Key dates
| Filing date | May 12, 2015 |
| Grant date | Mar 20, 2018 |
| Priority date | — |
| Expiry date | Sep 26, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided herein are nanostructures for lithium ion battery electrodes and methods of fabrication. In some embodiments, a nanostructure template coated with a silicon coating is provided. The silicon coating may include a non-conformal, more porous layer and a conformal, denser layer on the non-conformal, more porous layer. In some embodiments, two different deposition processes, e.g., a PECVD layer to deposit the non-conformal layer and a thermal CVD process to deposit the conformal layer, are used. Anodes including the nanostructures have longer cycle lifetimes than anodes made using either a PECVD or thermal CVD method alone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.