Methods of forming molybdenum sputtering targets
US9926623B2 · kind B2 · utility
0Cited by
8References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2016 |
| Grant date | Mar 27, 2018 |
| Priority date | — |
| Expiry date | Nov 19, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.