Patent · US Active

Plasma cell for providing VUV filtering in a laser-sustained plasma light source

US9927094B2 · kind B2 · utility

7Cited by

11References

23Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Ilya Bezel · Mountain View, US
Anatoly Shchemelinin · Pleasanton, US
Eugene Shifrin · Sunnyvale, US
Matthew Panzer · San Jose, US
Matthew Derstine · Sunnyvale, US
Jincheng Wang · Nanhu, CN
Anant Chimmalgi · San Jose, US
Rajeev Patil · Fremont, US
Rudolf Brunner · Baldham, DE

Key dates

Filing date	Jan 15, 2013
Grant date	Mar 27, 2018
Priority date	—
Expiry date	Jan 15, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J65/04
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma cell for use in a laser-sustained plasma light source includes a plasma bulb configured to contain a gas suitable for generating a plasma, the plasma bulb being transparent to light from a pump laser, wherein the plasma bulb is transparent to at least a portion of a collectable spectral region of illumination emitted by the plasma. The plasma bulb of the plasma cell is configured to filter short wavelength radiation, such as VUV radiation, emitted by the plasma sustained within the bulb in order to keep the short wavelength radiation from impinging on the interior surface of the bulb.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.